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Formation and characteristics of highly c-axis-oriented Bi3.25La0.75Ti3O12 thin films on SiO2/Si(100) and Pt/Ti/SiO2/Si(100) substrates

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dc.contributor.authorChon, Uong-
dc.contributor.authorJang, Hyun M.-
dc.contributor.authorLee, Sun-Hwa-
dc.contributor.authorYi, Gyu-Chul-
dc.date.accessioned2009-07-13T03:16:14Z-
dc.date.available2009-07-13T03:16:14Z-
dc.date.issued2001-11-01-
dc.identifier.citationJ. Mater. Res., 16, 3124 (2001)en
dc.identifier.issn0884-2914-
dc.identifier.urihttp://www.mrs.org-
dc.identifier.urihttps://hdl.handle.net/10371/5356-
dc.description.abstractHighly c-axis-oriented Bi3.25La0.75Ti3O12 (BLT) films with a homogeneous in-plane orientation were successfully grown on SiO2/Si(100) and Pt/Ti/SiO2/Si(100) substrates by a sol-coating route. The substitution of lanthanum ions for bismuth ions in the layered perovskite suppressed the formation of pyrochlore phase and enhanced the c-axis-oriented growth. The c-axis-oriented BLT film fabricated on a Pt/Ti/SiO2/Si(100) substrate showed fatigue-free characteristics with a large remanent polarization of 26-28 muC/cm(2) and the coercive field of 50-75 KV/cm. These features significantly enhance the potential value of the BLT film for the applications to high-density ferroelectric random-access memories devices. In addition, the c-axis-oriented BLT film, with a homogeneous in-plane orientation on an amorphous surface, can be used as a suitable template material for applications to various electro-magneto-optic devices.en
dc.description.sponsorshipThis study was supported by the KISTEP through the NRL program and by the Ministry of Education, Korea through the Brain Korea 21 program.en
dc.language.isoen-
dc.publisherMaterials Research Societyen
dc.titleFormation and characteristics of highly c-axis-oriented Bi3.25La0.75Ti3O12 thin films on SiO2/Si(100) and Pt/Ti/SiO2/Si(100) substratesen
dc.typeArticleen
dc.contributor.AlternativeAuthor전웅-
dc.contributor.AlternativeAuthor이선화-
dc.contributor.AlternativeAuthor이규철-
dc.identifier.doi10.1557/JMR.2001.0431-
dc.identifier.doi10.1557/JMR.2001.0431-
dc.citation.journaltitleJournal of Materials Research-
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