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Fabrication of Highly Ordered Multilayer Films Using a Spin Self-Assembly Method

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dc.contributor.authorCho, Jinhan-
dc.contributor.authorChar, Kookheon-
dc.contributor.authorHong, Jong-Dal-
dc.contributor.authorLee, Ki-Bong-
dc.date.accessioned2009-07-20-
dc.date.available2009-07-20-
dc.date.issued2001-07-12-
dc.identifier.citationAdv. Mater. 2001, 13, 1076en
dc.identifier.issn0935-9648 (print)-
dc.identifier.issn1521-4095 (online)-
dc.identifier.urihttps://hdl.handle.net/10371/5731-
dc.description.abstractA very short processing time for making well-organized multilayer films can be achieved employing the novel spin self-assembly method described in this paper. The authors elaborate on the advantages of this method versus conventional self-assembly methods for the fabrication of multilayer polyelectrolyte films. The Figure illustrates that the spinning process (bottom) yields far better organized layers than for instance the direct dipping method (top).en
dc.description.sponsorshipThis work was supported by the Ministry of Education through the Brain Korea 21 Program at Seoul National University and by the National Program for Tera-level Nano-devices of the Ministry of Science and Technology as one of the 21st century Frontier Programs as well as by the Korean Ministry of Science and Technology (MOST) under Grant 99-07. X-ray reflectivity experiments performed at the Pohang Light Source (PLS) were supported in part by MOST and POSCO. We are very grateful to S.-H. Lee, H. Kang, J. Koo, and B. H. Seung for their assistance during the X-ray reflectivity experiments.en
dc.language.isoen-
dc.publisherJohn Wiley & Sonsen
dc.subjectMultilayer architecturesen
dc.subjectSelf-assemblyen
dc.subjectSpin-coatingen
dc.subjectUltrathin filmsen
dc.titleFabrication of Highly Ordered Multilayer Films Using a Spin Self-Assembly Methoden
dc.typeArticleen
dc.contributor.AlternativeAuthor조진한-
dc.contributor.AlternativeAuthor차국헌-
dc.contributor.AlternativeAuthor홍종달-
dc.contributor.AlternativeAuthor이기봉-
dc.identifier.doi10.1002/1521-4095(200107)13:14<1076::AID-ADMA1076>3.0.CO;2-M-
dc.identifier.doi10.1002/1521-4095(200107)13:14<1076::AID-ADMA1076>3.0.CO;2-M-
dc.citation.journaltitleAdvanced Materials-
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