Publications
Detailed Information
Material issues for nanoporous ultra low-k dielectrics
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Char, Kookheon | - |
dc.contributor.author | Cha, Bong Jun | - |
dc.contributor.author | Kim, Suhan | - |
dc.date.accessioned | 2009-07-28 | - |
dc.date.available | 2009-07-28 | - |
dc.date.issued | 2004-06-07 | - |
dc.identifier.citation | Proceedings of the IEEE 2004 International Interconnect Technology Conference 2004, 219 | en |
dc.identifier.isbn | 0-7803-8308-7 | - |
dc.identifier.uri | http://ieeexplore.ieee.org/xpls/abs_all.jsp?isnumber=29623&arnumber=1345753 | - |
dc.identifier.uri | https://hdl.handle.net/10371/5852 | - |
dc.description.abstract | Using the molecularly designed porogen (pore generating agent) approach, novel nanoporous low-k materials with improved mechanical properties have been achieved based on poly(methylsilsesquioxane), PMSSQ, structure. Two different methods, microphase separation system and grafted porogen system, were adopted to realize nonporous ultra low-k dielectrics with superior mechanical properties. We found that the behavior of dielectric constant as well as thin film modulus depends on the molecular structure of a porogen. Within the decomposition temperature windows of grafted porogens, a low-k material with k < 2.2 and Young's modulus > 6 Gpa was achieved. These results indicate that it is possible to design and fabricate nanoporous thin films with balanced low dielectric constant and robust mechanical properties, which are highly desired for microelectronic industry. | en |
dc.description.sponsorship | This work is
supported by the Collaborative Project for Excellence in Basic System IC Technology. Financial supports from the Ministry of Science and Technology (MOST) (the National Research Laboratory Fund) and the Korean Ministry of Education through the Brain Korea 21 Program are also greatly acknowledged. | en |
dc.language.iso | en | - |
dc.publisher | Institute of Electrical and Electronics Engineers (IEEE) | en |
dc.title | Material issues for nanoporous ultra low-k dielectrics | en |
dc.type | Article | en |
dc.contributor.AlternativeAuthor | 차국헌 | - |
dc.contributor.AlternativeAuthor | 차봉준 | - |
dc.contributor.AlternativeAuthor | 김수한 | - |
- Appears in Collections:
- Files in This Item:
Item View & Download Count
Items in S-Space are protected by copyright, with all rights reserved, unless otherwise indicated.