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Microstructures of poly (ethylene glycol) by molding and dewetting

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dc.contributor.authorSuh, Kahp Y.-
dc.contributor.authorLee, Hong H.-
dc.date.accessioned2009-08-06T04:25:13Z-
dc.date.available2009-08-06T04:25:13Z-
dc.date.issued2003-08-25-
dc.identifier.citationAppl. Phys. Lett. 83, 1668 (2003)en
dc.identifier.issn0003-6951-
dc.identifier.urihttps://hdl.handle.net/10371/6230-
dc.description.abstractWe report on the fabrication of microstructures of poly (ethylene glycol) (PEG) using a soft molding technique. When a patterned poly (dimethylsiloxane) stamp is placed on a wet PEG film, the polymer in contact with the stamp spontaneously moves into the void space as a result of capillary action. Three types of microstructures are observed with the substrate surface completely exposed: a negative replica of the stamp, a two-dimensional projection of the simple cubic structure, and a two-dimensional projection of the diamond structure. A molding process is responsible for the first type and a dewetting process for the final two. A phase diagram is constructed based on the effects of molecular weight and concentration, which shows that mobility and confinement play a crucial role in determining the particular type of microstructure obtained. The PEG microstructure could be used as a lithographic resist in fabricating electronic devices and a resistant layer for preventing nonspecific adsorption of proteins or cells.en
dc.description.sponsorshipThis research was supported by, or supported in part by, the U.S. Army through the Institute for Soldier Nanotechnologies, under Contract No. DAAD-19-02-D0002 with the
U.S. Army Research Office.
en
dc.language.isoenen
dc.publisherAmerican Institute of Physicsen
dc.subject3-DIMENSIONAL MICROSTRUCTURESen
dc.subjectSOFT LITHOGRAPHYen
dc.subjectFABRICATIONen
dc.subjectSURFACESen
dc.subjectFILMSen
dc.titleMicrostructures of poly (ethylene glycol) by molding and dewettingen
dc.typeArticleen
dc.contributor.AlternativeAuthor서갑양-
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