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Morphology of thin films of lamellar diblock copolymers
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Y. S. | - |
dc.contributor.author | Suh, K. Y. | - |
dc.contributor.author | Lee, Hong H. | - |
dc.date.accessioned | 2009-08-06T05:33:56Z | - |
dc.date.available | 2009-08-06T05:33:56Z | - |
dc.date.issued | 1997-10 | - |
dc.identifier.citation | Phys. Rev. E. 56, 4887 (1997) | en |
dc.identifier.issn | 1539-3755 | - |
dc.identifier.uri | https://hdl.handle.net/10371/6264 | - |
dc.description.abstract | The morphology of unconfined thin films is determined for lamellar diblock copolymers. A criterion is developed for the conditions for island formation or flat surface. Also derived is the critical thickness of the film below which the morphology goes through a change from the flat surface to island structure. The period of underlying lamellar structure when islands form is determined. | en |
dc.language.iso | en | en |
dc.publisher | The American Physical Society | en |
dc.subject | FREE-SURFACE | en |
dc.title | Morphology of thin films of lamellar diblock copolymers | en |
dc.type | Article | en |
dc.contributor.AlternativeAuthor | 서갑양 | - |
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