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Inclusion complex of cetirizine dihydrochloride using supercritical anti-solvent (SAS) process : 초임계 역용매법을 이용한 세티리진 포접화합물의 제조

DC Field Value Language
dc.contributor.advisor이윤우-
dc.contributor.author이춘원-
dc.date.accessioned2010-05-07T02:12:14Z-
dc.date.available2010-05-07T02:12:14Z-
dc.date.copyright2010-
dc.date.issued2010-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000033574eng
dc.identifier.urihttps://hdl.handle.net/10371/64654-
dc.descriptionThesis(masters) --서울대학교 대학원 :화학생물공학부,2010.2.en
dc.format.extentvii, 69 leavesen
dc.language.isoenen
dc.publisher서울대학교 대학원en
dc.subject세티리진en
dc.subjectCetirizine dihydrochlorideen
dc.subject포접화합물en
dc.subjectInclusion complexen
dc.subject맛 차폐en
dc.subjectTaste maskingen
dc.subject초임계 이산화탄소en
dc.subjectβ-cyclodextrinen
dc.subject사이클로덱스트린en
dc.subjectSupercritical CO2en
dc.subject초임계 역용매 공정en
dc.subjectSupercritical antisolventen
dc.titleInclusion complex of cetirizine dihydrochloride using supercritical anti-solvent (SAS) processen
dc.title.alternative초임계 역용매법을 이용한 세티리진 포접화합물의 제조en
dc.typeThesis-
dc.contributor.department화학생물공학부-
dc.description.degreeMasteren
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