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Observation of High-Aspect-Ratio Nanostructures Using Capillary Lithography

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Authors
Suh, Kahp Y.; Choi, Se-Jin; Baek, Seung J.; Kim, Tae W.; Langer, Robert
Issue Date
2005-03-03
Publisher
John Wiley & Sons
Citation
Adv. Mater. 2005, 17, 560
Keywords
SOFT LITHOGRAPHYFORCE LITHOGRAPHYSTAMPSMICROSTRUCTURESRESOLUTIONPOLY(DIMETHYLSILOXANE)FABRICATIONSTABILITYCRYSTAL
Abstract
Several intriguing nanostructures, such as mushroom-like nanopillars, vertical nanopillars (see Figure), and nanospheres, are made using capillary lithography and a new, UV-curable mold consisting of polyurethane functionalized with an acrylate group. An aspect ratio as high as five is achieved for nanopillars 90 nm in diameter.
ISSN
0935-9648 (print)
1521-4095 (online)
Language
English
URI
http://hdl.handle.net/10371/6535
DOI
https://doi.org/10.1002/adma.200401089
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Mechanical Aerospace Engineering (기계항공공학부)Journal Papers (저널논문_기계항공공학부)
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