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Atomic oxygen generation by in-situ plasma and post-plasma in dielectric barrier discharges for surface treatment

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dc.contributor.authorKang, Woo Seok-
dc.contributor.authorKim, Hyun-Su-
dc.contributor.authorHong, Sang Hee-
dc.date.accessioned2010-08-26T22:32:29Z-
dc.date.available2010-08-26T22:32:29Z-
dc.date.issued2010-09-01-
dc.identifier.citationThin Solid Films 518 6578-6562 (2010)en
dc.identifier.issn0040-6090-
dc.identifier.urihttps://hdl.handle.net/10371/69363-
dc.description.abstractAtomic oxygen (AO) generation is experimentally and numerically investigated for in-situ plasma and post-plasma produced by dielectric barrier discharges (DBDs) for surface treatment. The AO generation in in-situ plasma inside a DBD reactor is closely related to the plasma characteristics depending on the applied voltage and O2 additive concentration, while the AO density distribution along the post-plasma ejected outside the reactor exit is influenced by the AO generation in the in-situ plasma, gas flow rate, and effluent distance. Contact angle measurements show that the metal surface characteristics, which are treated by in-situ plasma and post-plasma, respectively, are distinctive from each other depending on the AO densities.en
dc.description.sponsorshipPartially supported by the Nuclear R&D Program and the Brain Korea 21 (BK21) Program of the National Research Foundation (NRF) grant funded by the Korean government (MEST).en
dc.language.isoenen
dc.publisherElsevieren
dc.subjectdielectric barrier dischargeen
dc.subjectin-situ plasmaen
dc.subjectpost-plasmaen
dc.subjectatomic oxygenen
dc.subjectoptical actinometryen
dc.subjectNO titrationen
dc.subjectnumerical simulationen
dc.titleAtomic oxygen generation by in-situ plasma and post-plasma in dielectric barrier discharges for surface treatmenten
dc.typeArticleen
dc.contributor.AlternativeAuthor강우석-
dc.contributor.AlternativeAuthor김현수-
dc.contributor.AlternativeAuthor홍상희-
dc.identifier.doi10.1016/j.tsf.2010.04.045-
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