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Application of a New Cl-Plasma-Treated Ag/AgCl Reference Electrode to Micromachined Glucose Sensor

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Authors
Park, Se-Ik; Jun, Sang Beom; Park, Sejin; Kim, Hee Chan; Kim, Sung June
Issue Date
2003-06
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Citation
IEEE Sensors Journal, vol. 3, pp. 267-273, 2003
Keywords
Mass productionmicromachined glucose sensormonolithic integrationplasma-treated Ag/AgCl reference electrodepotential drift
Abstract
Micromachined glucose sensors were fabricated and
integrated with the plasma-treated Ag/AgCl reference electrodes
for the first time. The surface of the Cl-plasma exposed AgCl
layers was of granule-shaped morphology and showed the favorable
long-term stability with a 13-mV potential drift after 5 h
over a commercial liquid-junction Ag/AgCl reference electrode in
phosphate buffered saline. The fabricated devices showed a typical
behavior of an amperometric glucose sensor and a successful
operation as a three-electrode system. Due to the integrability of
the reference electrode and the use of low-temperature steps only,
the new micromachined process can allow easy mass production
of the device and the monolithic integration of signal processing
circuitry in the future.
ISSN
1530-437X
Language
English
URI
http://hdl.handle.net/10371/7841
DOI
https://doi.org/10.1109/JSEN.2003.814649
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Electrical and Computer Engineering (전기·정보공학부)Journal Papers (저널논문_전기·정보공학부)
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