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Density variation of nanoscale patterns in thermal nanoimprint lithography

Cited 13 time in Web of Science Cited 11 time in Scopus
Authors
Woo, Young Seok; Kim, Jae Kwan; Lee, Dong Eon; Suh, Kahp Y.; Lee, Woo Il
Issue Date
2007-12-19
Publisher
American Institute of Physics
Citation
Appl. Phys. Lett. 91, 253111 (2007)
Keywords
MOLECULAR-DYNAMICSCAPILLARY FORCESIMULATION
Abstract
Density variation of nanoscale patterns in thermal nanoimprint lithography was studied both by experiments and molecular dynamics simulations. A simple soft imprinting technique was used to fabricate various nanopatterns (70 nm and 600 nm lines and 150 nm dots) over a large area (2x3 cm(2)). Local density was measured by the relative magnitude of van der Waals interactions between a sharp tip and the patterned surface. In order to investigate the mechanism of density variation, molecular dynamic simulations were performed. Experimental and simulation results demonstrated that the density of the pressed region (valleys) was higher than that of the cavity region (hills) when a simple amorphous polymer is thermally imprinted with a patterned mold.
ISSN
0003-6951 (print)
1077-3118 (online)
Language
English
URI
http://hdl.handle.net/10371/8366
DOI
https://doi.org/10.1063/1.2827187
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Mechanical Aerospace Engineering (기계항공공학부)Journal Papers (저널논문_기계항공공학부)
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