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Optical lithography with printed metal mask and a simple superhydrophobic surface

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Authors
Kim, Tae-il; Baek, Chang hoon; Suh, Kahp Y.; Seo, Soon-min; Lee, Hong H.
Issue Date
2008-02
Publisher
Wiley-Blackwell
Citation
Small 2008, 4, 182
Keywords
nanolensesnanolithographynanostructuresprintingsuperhydrophobicity
Abstract
A nanolithographic optical patterning technique is presented. A metal pattern on a mold is transferred onto a photoresist on a substrate, then the resist with the printed metal mask is flood illuminated. The light passes through only the resist lenses that are formed in the transfer process. Focusing by these lenses results in a significant reduction in the feature size.
ISSN
1613-6810
Language
English
URI
http://hdl.handle.net/10371/9554
DOI
https://doi.org/10.1002/smll.200700882
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Mechanical Aerospace Engineering (기계항공공학부)Journal Papers (저널논문_기계항공공학부)
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