S-Space

Browse

Author

Showing results 1 to 2 of 2

Issue Date	Title / Author(s) / Citation	File	Altmetrics
2017-02	The characteristics of high etch rate ion beam etcher with magnetized inductively coupled plasma source Kim, J. W.; Cheong, H. W.; Hong, Y. T.; Whang, K. W. Plasma Sources Science and Technology, Vol.26 No.3, p. 035008	view file DOI
2021-12	PDMS-based RF Resonant Sensor for Measuring the Concentration of Micro-Plastics Kim, J. H.; Lee, K. H.; Cha, C. U.; Hong, Y. T. 2021 IEEE INTERNATIONAL CONFERENCE ON INDUSTRIAL ENGINEERING AND ENGINEERING MANAGEMENT (IEEE IEEM21), pp.293-296	DOI