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Issue Date	Title / Author(s) / Citation	File	Altmetrics
2021-06	Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O-2/Ar Capacitively Coupled Plasma Kwon, Ji-Won; Ryu, Sangwon; Park, Jihoon; Lee, Haneul; Jang, Yunchang; Park, Seolhye; Kim, Gon-Ho Materials, Vol.14 No.11, p. 3005	DOI
2022-08	Investigation of ion collision effect on electrostatic sheath formation in weakly ionized and weakly collisional plasma Lee, Haneul; Kim, Nam-Kyun; Lee, Myeong-Geon; Kwon, Ji-Won; Son, Sung Hyun; Bae, Namjae; Park, Taejun; Park, Seolhye; Kim, Gon-Ho Plasma Sources Science and Technology, Vol.31 No.8, p. 084006	DOI