Study on the prediction of thermal evaporated thin film profile in Roll-To-Roll process by Virtual Collision Direct Simulation Monte Carlo

Abstract

In this paper, the study to improve the performance of a simulation that is carried out to anticipate deposition profile of an organic thin film deposited by thermal evaporator is conducted. To anticipate a deposition profile, Direct Simulation Monte Carlo(DSMC) has been used to simulate a deposited profile shape. This is a way to expect gas flows in a high vacuum area where a continuum equation is no longer valid and molecules discrete effect is critical. However, the simulation time to analyze the flow in high vacuum rapidly increases when it applies to simulate background gas inside a chamber. In this paper, algorithm to reduce analysis time of a simulation when the background gas exists inside a chamber was suggested and tested. Also, this paper studies how to optimize uniformity of linear crucible and how to improve the material usage efficiency.