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Implementation of Synaptic Plasticity and Learning functions using Si-Based Charge-Trap Memory : 실리콘 기반의 전하 트랩 메모리를 이용한 시냅스의 가소성 및 학습 기능 구현

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dc.contributor.advisor이종호-
dc.contributor.authorMyoung-Sun Lee-
dc.date.accessioned2017-07-13T07:18:14Z-
dc.date.available2017-07-13T07:18:14Z-
dc.date.issued2016-08-
dc.identifier.other000000137447-
dc.identifier.urihttps://hdl.handle.net/10371/119235-
dc.description학위논문 (박사)-- 서울대학교 대학원 : 전기·컴퓨터공학부, 2016. 8. 이종호.-
dc.description.abstractThe development of an energy efficient and highly integrated electronic synapse is an important step in the effort to mimic the adaptive learning and memory in a biological neural network. Recently, several types of two-terminal memristors have been proposed to emulate biologically inspired synaptic functions using various components such as atomic switches, phase-change memory (PCM), and resistive switching devices. However, these two terminal devices require one select device per cell in a cell array to imitate a synapse-neuron network. Moreover, they need to be improved in terms of reliability, repeatability and processing complexity.
In this thesis, we propose a new silicon-based charge trap memory device with an Al2O3/HfO2/Si3N4 (A/H/N) gate stack to realize the imitation of memory features in a biological synapse. In a fabricated capacitor having the proposed gate stack, short-term plasticity (STP) and long-term potentiation (LTP) properties with their transition are demonstrated, which are similar to the behavior of biological synapses.
A single charge trapping layer (Si3N4) on silicon interface induces fast charge loss by trap-assisted tunneling (TAT) or direct tunneling. In addition, there is no remarkable pulse interval dependence when repeated input pulses are applied, in which the pulse amplitude and width are same. However, more frequent input pulses leads to larger current changes with longer retention property when HfO2 layer is inserted on Si3N4 layer as a second charge trapping layer. It is originated from the deep trap level (ET) in HfO2 layer leading to a transition into long-term memory. Lastly, we proposed a pair of pre- and post-synaptic spike scheme for the synaptic device and STDP property was demonstrated from experimental data.
This suggested architecture has remarkable advantages, including high uniformity over a large area, excellent reliability, the use of CMOS-compatible materials, and easy integration with CMOS circuits.
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dc.description.tableofcontentsChapter 1. Introduction 1
1.1 Motivation 1
1.2 Major factors influencing retention properties 2
1.3 Si3N4 and HfO2 for charge trap layers 5
1.4 Design of gate stack for synaptic device 7
1.5 Thesis organization 9

Chapter 2. Al2O3/HfO2/Si3N4 (A/H/N) gate stack 11
2.1 Introduction 11
2.2 Fabrication process for a capacitor 12
2.3 Measurement setup 14
2.4 C-V characteristics 15
2.5 Transient properties with C-t measurements 20

Chapter 3. Analysis of charge trapping and retention mechanism 30
3.1 Introduction 30
3.2 Measurement and discussion 31

Chapter 4. Synaptic characteristics in a FET device 41
4.1 Fabrication process of a FET device 41
4.2 Characteristics of SiO2/Si3N4 (O/N) stack 44
4.3 Scaling of Al2O3/HfO2/Si3N4 (A/H/N) stack 54
4.4 Spike-timing-dependent plasticity (STDP) 65

Chapter 5. Conclusions 70

Appendix. Spatial trap distribution near silicon interface 71
3.1 Introduction 71
3.2 Measurement results and discussion. 75

Bibliography 80

List of Publication 92

Abstract in Korean 94
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dc.formatapplication/pdf-
dc.format.extent2055458 bytes-
dc.format.mediumapplication/pdf-
dc.language.isoen-
dc.publisher서울대학교 대학원-
dc.subject시냅스 모방 소자-
dc.subject.ddc621-
dc.titleImplementation of Synaptic Plasticity and Learning functions using Si-Based Charge-Trap Memory-
dc.title.alternative실리콘 기반의 전하 트랩 메모리를 이용한 시냅스의 가소성 및 학습 기능 구현-
dc.typeThesis-
dc.description.degreeDoctor-
dc.citation.pages95-
dc.contributor.affiliation공과대학 전기·컴퓨터공학부-
dc.date.awarded2016-08-
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