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Deposition and characterization of low-k SiOC:H dielectrics and its compatibility with Ruthenium as metal barrier : SiOC:H 저유전 박막의 특성 개선과 Ru 금속 확산 방지막과의 연관성에 관한 연구
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 김형준 | - |
| dc.contributor.author | 허재영 | - |
| dc.date.accessioned | 2009-11-18 | - |
| dc.date.available | 2009-11-18 | - |
| dc.date.copyright | 2008. | - |
| dc.date.issued | 2008 | - |
| dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000041535 | eng |
| dc.identifier.uri | https://hdl.handle.net/10371/12647 | - |
| dc.description | Thesis(doctors) --서울대학교 대학원 :재료공학부,2008.8. | eng |
| dc.format.extent | xv, 194 p. | eng |
| dc.language.iso | en | eng |
| dc.publisher | 서울대학교 대학원 | eng |
| dc.subject | 저유전박막 | eng |
| dc.subject | Low-k | eng |
| dc.subject | 유전상수 | eng |
| dc.subject | Dielectric constant | eng |
| dc.subject | X-선 반사율 | eng |
| dc.subject | X-ray Reflectivity (XRR) | eng |
| dc.subject | UV 오존 | eng |
| dc.subject | Ultraviolet-assisted ozone (UV-O3) | eng |
| dc.subject | 루세늄 | eng |
| dc.subject | Ruthenium | eng |
| dc.subject | 원자층 증착 | eng |
| dc.subject | Atomic layer deposition (ALD) | eng |
| dc.subject | 확산 방지막 | eng |
| dc.subject | Diffusion barrier | eng |
| dc.title | Deposition and characterization of low-k SiOC:H dielectrics and its compatibility with Ruthenium as metal barrier | eng |
| dc.title.alternative | SiOC:H 저유전 박막의 특성 개선과 Ru 금속 확산 방지막과의 연관성에 관한 연구 | eng |
| dc.type | Thesis | - |
| dc.contributor.department | 재료공학부 | - |
| dc.description.degree | Doctor | eng |
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