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College of Engineering/Engineering Practice School (공과대학/대학원)
Dept. of Materials Science and Engineering (재료공학부)
Theses (Ph.D. / Sc.D._재료공학부)
Deposition behavior and dielectric properties of high dielectric constant oxide thin films : 고유전율 산화물 박막의 증착 거동 및 유전 특성
- Authors
- Advisor
- 김형준
- Issue Date
- 2006
- Publisher
- 서울대학교 대학원
- Keywords
- high-κ ; high-κ ; MOCVD ; MOCVD ; ALD ; ALD ; TiO2 ; TiO2 ; Al2O3 ; Al2O3 ; AlN ; AlN ; La2O3 ; La2O3 ; 증착거동 ; deposition behavior ; 누설전류 ; leakage current mechanism ; 밴드갭 ; band gap ; XPS ; XPS ; 계면트랩밀도 ; interface trap density
- Description
- Thesis(doctoral)--서울대학교 대학원 :재료공학부,2006.
- Language
- English
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000046482
https://hdl.handle.net/10371/12648
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