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Strain relaxation of Si1-xGex(001) layers on Si(001) substrates using heat treatment : 열처리를 이용한 Si1-xGex(001) 박막의 격자 이완에 대한 연구
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- Authors
- Advisor
- 윤의준
- Issue Date
- 2006
- Publisher
- 서울대학교 대학원
- Keywords
- 가스소스 분자선 에피탁시 ; Gas-source molecular beam epitaxy ; 초고진공화학기상증착법 ; ultrahigh vacuum chemical vapor deposition ; 격자 이완 ; strain relaxation ; SiGe ; SiGe ; Si ; Si ; 급속 열처리 ; rapid thermal annealing ; 격자 맞춤 완충 막 ; lattice matched buffer layer ; 산화 보호막 ; oxide caps ; 표면 확산 ; surface diffusion ; 불일치 전위 ; misfit dislocation ; strain-induced roughening ; crosshatch patterns
- Description
- Thesis(doctoral)--서울대학교 대학원 :재료공학부,2006.
- Language
- English
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000046473
https://hdl.handle.net/10371/12657
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