Publications
Detailed Information
Fabrication and characterization of planar 4H-SiC metal semiconductor field effect transistors for microwave power device applications
DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | 김형준 | - |
dc.contributor.author | 나훈주 | - |
dc.date.accessioned | 2009-11-18T02:02:52Z | - |
dc.date.available | 2009-11-18T02:02:52Z | - |
dc.date.copyright | 2005. | - |
dc.date.issued | 2005 | - |
dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000050053 | eng |
dc.identifier.uri | https://hdl.handle.net/10371/12716 | - |
dc.description | Thesis(doctoral)--서울대학교 대학원 :재료공학부,2005. | eng |
dc.format.extent | xv, 148 leaves | eng |
dc.language.iso | en | - |
dc.publisher | 서울대학교 대학원 | eng |
dc.subject | 4H-탄화규소 | eng |
dc.subject | 4H-SiC | eng |
dc.subject | MESFET | eng |
dc.subject | MESFET | eng |
dc.subject | 이온주입 | eng |
dc.subject | Ion-implantation | eng |
dc.subject | 오믹접합 | eng |
dc.subject | Ohmic contact | eng |
dc.subject | 쇼트키접합 | eng |
dc.subject | Schottky contact | eng |
dc.subject | 게이트 구조 | eng |
dc.subject | Gate dimension | eng |
dc.subject | 전도성 기판 | eng |
dc.subject | Conducting substrate | eng |
dc.subject | 반절연 기판 | eng |
dc.subject | Semi-insulating substrate | eng |
dc.subject | 소신호등가회로 | eng |
dc.subject | Small-signal equivalent circuit | eng |
dc.title | Fabrication and characterization of planar 4H-SiC metal semiconductor field effect transistors for microwave power device applications | eng |
dc.type | Thesis | - |
dc.contributor.department | 재료공학부 | - |
dc.description.degree | Doctor | eng |
- Appears in Collections:
- Files in This Item:
- There are no files associated with this item.
Item View & Download Count
Items in S-Space are protected by copyright, with all rights reserved, unless otherwise indicated.