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Photo-sensitive epoxy system and copper complexed methacrylate polymer; BARC, E-beam lithography and biocidal applications : 감광성 에폭시 시스템과 구리 함유 아크릴 고분자; 반사방지막, 전자빔 리소그래피와 항균물질로의 응용
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 이종찬 | - |
| dc.contributor.author | 허근 | - |
| dc.date.accessioned | 2009-11-18T04:57:22Z | - |
| dc.date.available | 2009-11-18T04:57:22Z | - |
| dc.date.copyright | 2009. | - |
| dc.date.issued | 2009 | - |
| dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000036104 | eng |
| dc.identifier.uri | https://hdl.handle.net/10371/12990 | - |
| dc.description | Thesis(doctors) --서울대학교 대학원 :화학생물공학부,2009.2. | eng |
| dc.format.extent | ix, 90 leaves. | eng |
| dc.language.iso | en | - |
| dc.publisher | 서울대학교 대학원 | eng |
| dc.subject | 포토리소그래피 | eng |
| dc.subject | photo lithography | eng |
| dc.subject | 가교반응 | eng |
| dc.subject | Crosslinking | eng |
| dc.subject | 카보네이트 | eng |
| dc.subject | Carbonate | eng |
| dc.subject | 구리 착화합물 | eng |
| dc.subject | Copper complex | eng |
| dc.subject | 나노그물구조 | eng |
| dc.subject | Nanonetwork | eng |
| dc.subject | 전자빔 리소그래피 | eng |
| dc.subject | Electron beam lithography | eng |
| dc.subject | 항균성 | eng |
| dc.subject | Biocidal activity. | eng |
| dc.title | Photo-sensitive epoxy system and copper complexed methacrylate polymer; BARC, E-beam lithography and biocidal applications | eng |
| dc.title.alternative | 감광성 에폭시 시스템과 구리 함유 아크릴 고분자; 반사방지막, 전자빔 리소그래피와 항균물질로의 응용 | eng |
| dc.type | Thesis | - |
| dc.contributor.department | 화학생물공학부 | - |
| dc.description.degree | Doctor | eng |
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