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(A) novel cyclic depositionetching process to obtain bowing-free SiO2 contact holes : 산화막 콘택홀의 벽면 벌어짐 현상을 개선하기 위한 새로운 식각 공정의 개발
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 문상흡 | - |
| dc.contributor.author | 이진관 | - |
| dc.date.accessioned | 2009-11-18T04:58:48Z | - |
| dc.date.available | 2009-11-18T04:58:48Z | - |
| dc.date.copyright | 2009. | - |
| dc.date.issued | 2009 | - |
| dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000038234 | eng |
| dc.identifier.uri | https://hdl.handle.net/10371/12995 | - |
| dc.description | Thesis(doctors) --서울대학교 대학원 :화학생물공학부,2009.8. | eng |
| dc.format.extent | xvi, 127 p. | eng |
| dc.language.iso | en | - |
| dc.publisher | 서울대학교 대학원 | eng |
| dc.subject | 산화막 | eng |
| dc.subject | Bowing | eng |
| dc.subject | 콘택홀 | eng |
| dc.subject | Necking | eng |
| dc.subject | 벽면 벌어짐 | eng |
| dc.subject | contact hole | eng |
| dc.subject | plasma etching | eng |
| dc.subject | C4F6 | eng |
| dc.title | (A) novel cyclic depositionetching process to obtain bowing-free SiO2 contact holes | eng |
| dc.title.alternative | 산화막 콘택홀의 벽면 벌어짐 현상을 개선하기 위한 새로운 식각 공정의 개발 | eng |
| dc.type | Thesis | - |
| dc.contributor.department | 화학생물공학부 | - |
| dc.description.degree | Doctor | eng |
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