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Property improvement of the Ruthenium thin films deposited by metal-organic chemical vapor deposition for the electrodes of the DRAM devices
DRAM 소자의 전극 물질로의 적용을 위해 유기화학기상 증착법으로 증착한 Ru 박막의 특성 개선에 관한 연구

DC Field Value Language
dc.contributor.advisor김형준-
dc.contributor.author김범석-
dc.date.accessioned2009-11-18T06:19:01Z-
dc.date.available2009-11-18T06:19:01Z-
dc.date.copyright2008.-
dc.date.issued2008-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000039488eng
dc.identifier.urihttps://hdl.handle.net/10371/13208-
dc.descriptionThesis(doctors) --서울대학교 대학원 :재료공학부, 2008.2.eng
dc.format.extentxv, 156 p.eng
dc.language.isoen-
dc.publisher서울대학교 대학원eng
dc.subjectRueng
dc.subjectRueng
dc.subject유기금속화학기상증착eng
dc.subjectMOCVDeng
dc.subjectDRAMeng
dc.subjectDRAMeng
dc.subject핵생성eng
dc.subjectnucleationeng
dc.subject일함수eng
dc.subjectwork functioneng
dc.subjectagglomerationeng
dc.subjectagglomerationeng
dc.titleProperty improvement of the Ruthenium thin films deposited by metal-organic chemical vapor deposition for the electrodes of the DRAM deviceseng
dc.title.alternativeDRAM 소자의 전극 물질로의 적용을 위해 유기화학기상 증착법으로 증착한 Ru 박막의 특성 개선에 관한 연구eng
dc.typeThesis-
dc.contributor.department재료공학부-
dc.description.degreeDoctoreng
Appears in Collections:
College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Material Science and Engineering (재료공학부) Theses (Ph.D. / Sc.D._재료공학부)
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