S-Space Graduate School of Convergence Science and Technology (융합과학기술대학원) Dept. of Transdisciplinary Studies(융합과학부) Theses (Master's Degree_융합과학부)
Fabrication of Micropatterned ZnO Semiconductor Films via Chemical Imprinting
화학적 임프린팅을 이용한 마이크로패턴의 산화아연 반도체 박막 형성에 관한 연구
- 융합과학기술대학원 융합과학부(나노융합전공)
- Issue Date
- 서울대학교 대학원
- imprint lithography; soft lithography; solution-processed Zinc oxide(ZnO); thin films transistors (TFTs); selective chemical etching
- 학위논문 (석사)-- 서울대학교 융합과학기술대학원 : 융합과학부(나노융합전공), 2013. 2. 김연상.
- Herein, we demonstrated a new patterning method via chemical imprinting with an ammonia-soaked PDMS stamp on the ZnO semiconductor films. The diffused ammonia liquid or gas from the PDMS stamp with fine structures selectively transformed the ZnO films to a water-soluble form (as [Zn(NH3)4-n(OH)n]2-n) at the contact surfaces, and these selectively transformed aqueous salt patterns were dissolved in water. Thus, the array of ZnO
micro-patterns were easily fabricated and successfully applied to the active layers of TFTs. In addition, we fabricated the micro-patterns on Li doped ZnO semiconductor films, which have high carrier mobility and low temperature sintering at 300 °C.
The present study demonstrates the representative
micro-patterned Li doped ZnO TFTs with the field effect
mobility of 4.2 cm2·V-1·s-1, on/off current ratio of 8.3 x 107 and low gate leakage current using this chemical imprinting. This patterning method has a good potential for advanced patterning process toward solution-processed ZnO TFTs with high performance
it can be applied to continuous processes at ambient conditions, such as the roll to roll process, and does not require any cumbersome steps.