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(The)nanostructure and the properties of superhard TaN thins films deposited by plasma-assisted sputtering : 플라즈마 스퍼터링법으로 제조한 초경 TaN 박막의 나노구조와 성질에 관한 연구
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- Authors
- Advisor
- 이정중
- Issue Date
- 2007
- Publisher
- 서울대학교 대학원
- Keywords
- 초고진공 ; Ultra high vacuum sputtering ; 유도결합플라즈마 ; inductively coupled plasma ; 스퍼터링 ; ICP sputtering ; 질소분율 ; nitrogen fraction ; 이온에너지 ; ion energy ; 저온공정 ; low temperature deposition ; 초경박막 ; superhardness ; TaN ; TaN ; 멀티레이어 ; tantalum nitride ; 라멜라구조 ; multi phase ; 잔류응력 ; multilayer ; 표면조도 ; lamellar structure ; 확산방지막 ; residual stress ; 비저항 ; surface roughness ; diffusion barrier ; resistivity
- Description
- 학위논문(박사)--서울대학교 대학원 :재료공학부,2007.
- Language
- English
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000042911
https://hdl.handle.net/10371/13580
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