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Chemical vapor deposition of silicon thin film by hot-wire method : the charge effect approach : 열 필라멘트법에 의한 실리콘박막 화학기상증착에서의 전하효과
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 황농문 | - |
| dc.contributor.author | 송진호 | - |
| dc.date.accessioned | 2009-11-18T22:49:54Z | - |
| dc.date.available | 2009-11-18T22:49:54Z | - |
| dc.date.copyright | 2007. | - |
| dc.date.issued | 2007 | - |
| dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000042938 | eng |
| dc.identifier.uri | https://hdl.handle.net/10371/13589 | - |
| dc.description | 학위논문(박사) --서울대학교 대학원 :재료공학부,2007. | eng |
| dc.format.extent | 84 장 | eng |
| dc.language.iso | en | eng |
| dc.publisher | 서울대학교 대학원 | eng |
| dc.subject | 실리콘 | eng |
| dc.subject | Silicon Thin Film | eng |
| dc.subject | 박막증착 | eng |
| dc.subject | Hot-wire CVD | eng |
| dc.subject | 열 필라멘트 | eng |
| dc.subject | Gas Phase | eng |
| dc.subject | 전하 | eng |
| dc.subject | Charge | eng |
| dc.subject | 나노입자 | eng |
| dc.subject | Nanoparticle | eng |
| dc.subject | 쌍정 | eng |
| dc.subject | Twin | eng |
| dc.subject | Surface Roughness | eng |
| dc.title | Chemical vapor deposition of silicon thin film by hot-wire method : the charge effect approach | eng |
| dc.title.alternative | 열 필라멘트법에 의한 실리콘박막 화학기상증착에서의 전하효과 | eng |
| dc.type | Thesis | - |
| dc.contributor.department | 재료공학부 | - |
| dc.description.degree | Doctor | eng |
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