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High-precision Submicron Patterning of Organic-Inorganic Hybrid Perovskite Thin Film with Minimizing Edge Effect
가장자리효과를 최소화하는 유-무기 하이브리드 페로브스카이트 박막의 고정밀 서브마이크론 패터닝

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Authors
김준수
Advisor
김대형
Major
공과대학 화학생물공학부
Issue Date
2018-02
Publisher
서울대학교 대학원
Keywords
Organic-inorganic hybrid perovskitepatterningsubmicronphotodetectordewettingtrench
Description
학위논문 (석사)-- 서울대학교 대학원 : 공과대학 화학생물공학부, 2018. 2. 김대형.
Abstract
Organic-inorganic hybrid perovskite materials have got into the spotlight for their remarkable optoelectronic performance. They are expected to replace the photoactive layer in commercial silicon-based opotoelectronic devices such as solar cell and photodetector. However, their weak stability in various solvents makes them incompatible with conventional photolithography process, which is highly desirable for solution-processed device array. Although some research groups reported patterning methods to solve this problem, they are suffering from low patterning yield and low patterning quality at the pattern edge. Here, I propose a new patterning method of CH3NH3PbI3 by employing SiO2 trench and dodecyltrichlorosilane, which minimizes shrinkage of CH3NH3PbI3 near the pattern edge and makes it possible to realize submicron pattern of CH3NH3PbI3 thin film. As a demonstration, Au/CH3NH3PbI3/Au photoresistor type photodetector was fabricated by the proposed method. This patterning method provides a new potential for fine-patterned organic-inorganic hybrid material based device.
Language
English
URI
https://hdl.handle.net/10371/141623
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Chemical and Biological Engineering (화학생물공학부)Theses (Master's Degree_화학생물공학부)
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