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Electrical conduction mechanisms in HfO2 films grown by atomic layer deposition
산화물 박막의 전기 전도 기구에 관한 연구

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Authors
정두석
Advisor
황철성
Issue Date
2005
Publisher
서울대학교 대학원
Keywords
전기 전도 기구HfO2Poole-Frenkel conduction mechanismBardeen tunneling-Hamiltonian formalism
Description
Thesis(master`s)--서울대학교 대학원 :재료공학부,2005.
Language
English
URI
http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000051027

https://hdl.handle.net/10371/14326
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Material Science and Engineering (재료공학부) Theses (Master's Degree_재료공학부)
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