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Electrical conduction mechanisms in HfO2 films grown by atomic layer deposition : 산화물 박막의 전기 전도 기구에 관한 연구
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- Authors
- Advisor
- 황철성
- Issue Date
- 2005
- Publisher
- 서울대학교 대학원
- Keywords
- 전기 전도 기구 ; HfO2 ; Poole-Frenkel conduction mechanism ; Bardeen tunneling-Hamiltonian formalism
- Description
- Thesis(master`s)--서울대학교 대학원 :재료공학부,2005.
- Language
- English
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000051027
https://hdl.handle.net/10371/14326
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