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Gate oxide로 사용될 CVD-HfxAlyO 박막의 전기적 특성 개선
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 김형준 | - |
| dc.contributor.author | 최지훈 | - |
| dc.date.accessioned | 2009-11-24T03:23:43Z | - |
| dc.date.available | 2009-11-24T03:23:43Z | - |
| dc.date.copyright | 2004. | - |
| dc.date.issued | 2004 | - |
| dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000055527 | kor |
| dc.identifier.uri | https://hdl.handle.net/10371/14338 | - |
| dc.description | 학위논문(석사)--서울대학교 대학원 :재료공학부,2004. | kor |
| dc.format.extent | ix, 73 장 | kor |
| dc.language.iso | ko | kor |
| dc.publisher | 서울대학교 대학원 | kor |
| dc.subject | HfAlO | kor |
| dc.subject | Hfalo | kor |
| dc.subject | gate oxide | kor |
| dc.subject | Gate oxide | kor |
| dc.subject | CVD | kor |
| dc.subject | Cvd | kor |
| dc.subject | HRTEM | kor |
| dc.subject | Hrtem | kor |
| dc.subject | XPS | kor |
| dc.subject | Xps | kor |
| dc.subject | HF cleaning | kor |
| dc.subject | Hf cleaning | kor |
| dc.title | Gate oxide로 사용될 CVD-HfxAlyO 박막의 전기적 특성 개선 | kor |
| dc.type | Thesis | - |
| dc.contributor.department | 재료공학부 | - |
| dc.description.degree | Master | kor |
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