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Influence of micro and nano-scale roughness on hydrophobicity of a plasma-treated woven fabric
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, Sohyun | - |
dc.contributor.author | Kim, Jooyoun | - |
dc.contributor.author | Park, Chung Hee | - |
dc.creator | 박정희 | - |
dc.date.accessioned | 2019-04-24T08:25:18Z | - |
dc.date.available | 2020-04-05T08:25:18Z | - |
dc.date.created | 2018-06-01 | - |
dc.date.issued | 2017-01 | - |
dc.identifier.citation | Textile Research Journal, Vol.87 No.2, pp.193-207 | - |
dc.identifier.issn | 0040-5175 | - |
dc.identifier.uri | https://hdl.handle.net/10371/147569 | - |
dc.description.abstract | A superhydrophobic fabric surface was fabricated by forming a dual roughness structure in combination with lowered surface energy. The contribution of the innate micro-scale roughness resulting from the waviness of filaments and yarns in a woven fabric on hydrophobicity was investigated in comparison with a smooth film surface. Though the micro-scale roughness coming from the multi-filaments of fabric was conducive in enhancing the hydrophobicity of the surface, the micro-scale roughness itself was not enough to create superhydrophobicity. Thus a nano-scale roughness was introduced by an anisotropic etching employing oxygen plasma etching followed by plasma enhanced chemical vapor deposition. As for the nano-scale roughness, however, it was possible to achieve the superhydrophobicity only with nano-scale roughness, but with a very large aspect ratio of nano-pillar structure. In the presence of dual-scale roughness consisting of both micro-and nano-scale structures, the superhydrophobic characteristic was effectively achieved even at a small aspect ratio of nano-pillar. By adjusting the number of filaments in a yarn and by controlling the plasma process time, it was possible to control the dual-scale roughness of a woven fabric and its wettability. An excessive thinning and lengthening of nano-pillars may negatively affect the hydrophobicity by the collapse and aggregation of pillar tips, and an appropriate processing condition is critical to design a durable superhydrophobic surface. | - |
dc.language | 영어 | - |
dc.language.iso | en | en |
dc.publisher | SAGE Publications | - |
dc.title | Influence of micro and nano-scale roughness on hydrophobicity of a plasma-treated woven fabric | - |
dc.type | Article | - |
dc.identifier.doi | 10.1177/0040517515627169 | - |
dc.citation.journaltitle | Textile Research Journal | - |
dc.identifier.wosid | 000391803100006 | - |
dc.identifier.scopusid | 2-s2.0-85006246968 | - |
dc.description.srnd | OAIID:RECH_ACHV_DSTSH_NO:220160000002325005 | - |
dc.description.srnd | RECH_ACHV_FG:RR00200001 | - |
dc.description.srnd | ADJUST_YN: | - |
dc.description.srnd | EMP_ID:A001929 | - |
dc.description.srnd | CITE_RATE:1.54 | - |
dc.description.srnd | DEPT_NM:의류학과 | - |
dc.description.srnd | EMAIL:junghee@snu.ac.kr | - |
dc.description.srnd | SCOPUS_YN:Y | - |
dc.citation.endpage | 207 | - |
dc.citation.number | 2 | - |
dc.citation.startpage | 193 | - |
dc.citation.volume | 87 | - |
dc.description.isOpenAccess | N | - |
dc.contributor.affiliatedAuthor | Kim, Jooyoun | - |
dc.contributor.affiliatedAuthor | Park, Chung Hee | - |
dc.identifier.srnd | 220160000002325005 | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.subject.keywordPlus | SUPERHYDROPHOBIC SURFACES | - |
dc.subject.keywordPlus | RF PLASMA | - |
dc.subject.keywordPlus | LOTUS | - |
dc.subject.keywordPlus | NANOSTRUCTURES | - |
dc.subject.keywordPlus | BEHAVIOR | - |
dc.subject.keywordPlus | FIBERS | - |
dc.subject.keywordAuthor | superhydrophobicity | - |
dc.subject.keywordAuthor | plasma etching | - |
dc.subject.keywordAuthor | plasma enhanced chemical vapor deposition (PECVD) | - |
dc.subject.keywordAuthor | contact angle | - |
dc.subject.keywordAuthor | dual-scale roughness | - |
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