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유기 금속 화학 증창법을 이용한 Hf 기반 게이트 금속전극용 박막의 성장 및 특성향상에 관한 연구
Study of film growth and characteristics enhancement of Hf-based gate matal electrode deposited by metal organic chemical vapor deposition

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Authors
장재혁
Advisor
김미영
Issue Date
2007
Publisher
서울대학교 대학원
Keywords
Hf기반 게이트HfN금속전극metal gate유기금속화학 증착법MOCVD
Description
학위논문(석사) --서울대학교 대학원 :재료공학부,2007.
Language
Korean
URI
http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000043720

https://hdl.handle.net/10371/14883
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Materials Science and Engineering (재료공학부)Theses (Master's Degree_재료공학부)
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