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(The)Growth characteristics of (Ba,Sr)Tio3 thin films grown near 460℃ using a dome-type MOCVD reactor
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- Authors
- Advisor
- 황철성
- Issue Date
- 2006
- Publisher
- 서울대학교 대학원
- Keywords
- BST ; BST ; MOCVD ; MOCVD ; 유전율(Deielctric constant) ; Capacitance ; Dielectric constant
- Description
- Thesis(master`s)--서울대학교 대학원 :재료공학부,2006.
- Language
- English
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000047486
https://hdl.handle.net/10371/15000
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