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단원자층 증착법(ALD)을 이용한 PbTiO3 박막의 증착과 특성평가 : Deposition and characterization of PbTiO3films using atomic layer deposition

DC Field Value Language
dc.contributor.advisor황철성-
dc.contributor.author황규원-
dc.date.accessioned2009-11-25T02:42:11Z-
dc.date.available2009-11-25T02:42:11Z-
dc.date.copyright2006.-
dc.date.issued2006-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000049253kor
dc.identifier.urihttps://hdl.handle.net/10371/15009-
dc.description학위논문(석사) --서울대학교 대학원 :재료공학부,2006.kor
dc.format.extentix, 102 p.kor
dc.language.isoko-
dc.publisher서울대학교 대학원kor
dc.subjectPbTiO3kor
dc.subjectALDkor
dc.subjectperovskitekor
dc.subjectpyrochlorekor
dc.subjectannealingkor
dc.title단원자층 증착법(ALD)을 이용한 PbTiO3 박막의 증착과 특성평가kor
dc.title.alternativeDeposition and characterization of PbTiO3films using atomic layer depositionkor
dc.typeThesis-
dc.contributor.department재료공학부-
dc.description.degreeMasterkor
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