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열필라멘트법을 이용한 저온 실리콘 화학 기상 증착 공정 중 발생하는 전하 운반체의 거동 : Generation of electrically charged carriers during low temperature deposition of Si films by hot wire chemical vapor deposition

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dc.contributor.advisor황농문-
dc.contributor.author양승민-
dc.date.accessioned2009-11-27T05:35:12Z-
dc.date.available2009-11-27T05:35:12Z-
dc.date.copyright2009.-
dc.date.issued2009-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000036854kor
dc.identifier.urihttps://hdl.handle.net/10371/16629-
dc.description학위논문(석사) --서울대학교 대학원 :재료공학부, 2009.2.kor
dc.format.extent64장kor
dc.language.isokokor
dc.publisher서울대학교 대학원kor
dc.subject저온 다결정 실리콘kor
dc.subject하전된 나노입자kor
dc.subject열필라멘트 화학기상증착kor
dc.subjectFE-SEMkor
dc.subjectRaman spectroscopykor
dc.title열필라멘트법을 이용한 저온 실리콘 화학 기상 증착 공정 중 발생하는 전하 운반체의 거동kor
dc.title.alternativeGeneration of electrically charged carriers during low temperature deposition of Si films by hot wire chemical vapor depositionkor
dc.typeThesis-
dc.contributor.department재료공학부-
dc.description.degreeMasterkor
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