Spontaneous generation of charged atoms or clusters during thermal evaporation of silver

Abstract

Spontaneous generation of charged atoms or clusters was investigated during thermal evaporation of silver. For this, the effect of the applied electric bias on the film growth rate was examined during evaporation of silver at 1373 K in a tungsten basket. Film growth rates on three silicon substrates biased + 300, 0 and -300 V with respect to the chamber were 300, 420 and 960 nm per hour, respectively. The number density of generated positively-charged atoms or clusters could be measured by the electric current on the Faraday cup in the chamber. From the temperature dependence of the positive current, the activation energy for charging was determined to be similar to 2.2 eV. This value could be best explained by the surface ionization of clusters of a few atoms on the oxidized tungsten surface.