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Optimal Marking of Garment Patterns using Rectilinear Polygon Approximation

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Authors
Sul, In Hwan; Kang, Tae Jin
Issue Date
2002-09
Publisher
Emerald
Citation
International Journal of Clothing Science and Technology, vol. 14, no.5, pp. 334-346
Keywords
Garment designManufacturingGarments
Abstract
Pattern marking is the allocation of garment patterns on the cloth roll minimizing the fabric loss, and thus very important for the cost reduction in garment manufacturing industries. But automatic marking is very difficult because it is a non-deterministic in polynomial time problem. Most previous pattern marking methods needed collision detection routine to lay out patterns without interfering each other, which was the bottle neck of nesting speed. In this study, rectilinear polygon approximation technique was used to reduce the overall calculation time because the garment patterns are usually in non-convex shape that can effectively be approximated by rectangles. Additionally, we adapted stochastic simulated annealing to search the optimal pattern marking.
ISSN
0955-6222
Language
English
URI
http://hdl.handle.net/10371/19239
DOI
https://doi.org/10.1108/09556220210446149
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College of Engineering/Engineering Practice School (공과대학/대학원)Dept. of Material Science and Engineering (재료공학부) Journal Papers (저널논문_재료공학부)
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