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Removal of tetramethylammonium hydroxide (TMAH) in semiconductor wastewater using the nano-ozone H2O2 process
DC Field | Value | Language |
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dc.contributor.author | Kim, Tae-Kyoung | - |
dc.contributor.author | Kim, Taeyeon | - |
dc.contributor.author | Lee, Inae | - |
dc.contributor.author | Choi, Kyungho | - |
dc.contributor.author | Zoh, Kyung-Duk | - |
dc.date.accessioned | 2023-09-25T05:52:11Z | - |
dc.date.available | 2023-09-25T05:52:11Z | - |
dc.date.created | 2021-04-16 | - |
dc.date.issued | 2021-05-05 | - |
dc.identifier.citation | Journal of Hazardous Materials, Vol.409 | - |
dc.identifier.issn | 0304-3894 | - |
dc.identifier.uri | https://hdl.handle.net/10371/195613 | - |
dc.description.abstract | In this study, we used a nano-ozone bubble to enhance the efficiency of the ozone/H(2)O(2 )process for the degradation of tetramethylammonium hydroxide (TMAH) found in semiconductor wastewater at high levels. The nano-ozone bubble significantly increased ozone mass transfer rate compared to that of the macro-ozone bubble. The half-life of nano-ozone bubbles was 23 times longer than that of the nano-ozone bubbles. Due to the high ozone mass transfer rate and its durability, the nano-ozone bubble increased the TMAH degradation rate compared to that of the macro-ozone. The addition of H2O2 significantly increased the TMAH degradation rate constant by (OH)-O-center dot production during the nano-ozone bubbles/H(2)O(2 )process. The optimum conditions for TMAH removal was 25 degrees C and pH 10. Within 90 min of the nano-ozone/H(2)O(2 )process, TOC removal was 65 % while 80 % of nitrogen was converted into nitrate (NO3) with 95 % of TMAM removal. Decreases in acute (40-fold) and chronic (2-fold) toxicity were achieved after applying the nano-ozone/H(2)O(2 )process to TMAH containing wastewater. However, there was no significant chronic toxicity decrease during the nano-ozone/H(2)O(2 )process of TMAH. | - |
dc.language | 영어 | - |
dc.publisher | Elsevier BV | - |
dc.title | Removal of tetramethylammonium hydroxide (TMAH) in semiconductor wastewater using the nano-ozone H2O2 process | - |
dc.type | Article | - |
dc.identifier.doi | 10.1016/j.jhazmat.2020.123759 | - |
dc.citation.journaltitle | Journal of Hazardous Materials | - |
dc.identifier.wosid | 000621666200008 | - |
dc.identifier.scopusid | 2-s2.0-85099277563 | - |
dc.citation.volume | 409 | - |
dc.description.isOpenAccess | N | - |
dc.contributor.affiliatedAuthor | Choi, Kyungho | - |
dc.contributor.affiliatedAuthor | Zoh, Kyung-Duk | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.subject.keywordAuthor | Nano-ozone | - |
dc.subject.keywordAuthor | Peroxone | - |
dc.subject.keywordAuthor | Toxicity | - |
dc.subject.keywordAuthor | TMAH | - |
dc.subject.keywordAuthor | Semiconductor wastewater | - |
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