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Analytical threshold voltage model for double-gate MOSFETs with localized charges

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dc.contributor.authorKang, Hongki-
dc.contributor.authorHan, Jin-Woo-
dc.contributor.authorChoi, Yang-Kyu-
dc.date.accessioned2024-05-16T04:45:10Z-
dc.date.available2024-05-16T04:45:10Z-
dc.date.created2024-04-30-
dc.date.created2024-04-30-
dc.date.issued2008-08-
dc.identifier.citationIEEE Electron Device Letters, Vol.29 No.8, pp.927-930-
dc.identifier.issn0741-3106-
dc.identifier.urihttps://hdl.handle.net/10371/203136-
dc.description.abstractAn analytical threshold voltage model for double-gate MOSFETs with localized charges is developed. From the 2-D Poisson's equation with parabolic potential approximation, a compact threshold voltage model is derived. The proposed model is then verified with a 2-D device simulator. The model can be used to investigate hot-carrier-induced device degradation for various device dimensions and various charge distributions.-
dc.language영어-
dc.publisherInstitute of Electrical and Electronics Engineers-
dc.titleAnalytical threshold voltage model for double-gate MOSFETs with localized charges-
dc.typeArticle-
dc.identifier.doi10.1109/LED.2008.2000965-
dc.citation.journaltitleIEEE Electron Device Letters-
dc.identifier.wosid000258096000032-
dc.identifier.scopusid2-s2.0-48649092368-
dc.citation.endpage930-
dc.citation.number8-
dc.citation.startpage927-
dc.citation.volume29-
dc.description.isOpenAccessN-
dc.contributor.affiliatedAuthorKang, Hongki-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.subject.keywordAuthordouble-gate (DG) MOSFETs-
dc.subject.keywordAuthorhot-carrier effects (HCEs)-
dc.subject.keywordAuthorlocalized charge-
dc.subject.keywordAuthorsurface potential-
dc.subject.keywordAuthorthreshold voltage-
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