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Inking Elastomeric Stamps with Micro-Patterned, Single Layer Graphene to Create High-Performance OFETs

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dc.contributor.authorKang, Seok Ju-
dc.contributor.authorKim, Bumjung-
dc.contributor.authorKim, Keun Soo-
dc.contributor.authorZhao, Yue-
dc.contributor.authorChen, Zheyuan-
dc.contributor.authorLee, Gwan Hyoung-
dc.contributor.authorHone, James-
dc.contributor.authorKim, Philip-
dc.contributor.authorNuckolls, Colin-
dc.date.accessioned2024-05-20T07:30:21Z-
dc.date.available2024-05-20T07:30:21Z-
dc.date.created2024-05-20-
dc.date.issued2011-08-
dc.identifier.citationAdvanced Materials, Vol.23 No.31, pp.3531-3535-
dc.identifier.issn0935-9648-
dc.identifier.urihttps://hdl.handle.net/10371/203543-
dc.description.abstractPattern array of CVD-grown single layer graphene (SLG) is demonstrated by using a micro-patterned PDMS stamp. These ultrathin SLG electrodes can be used as the source and drain for organic field effect transistors. The devices have high hole mobilities exceeding 10 cm(2)/Vs, high on-off current ratios, i.e., larger than 10, and a low threshold voltage for switching.-
dc.language영어-
dc.publisherWILEY-VCH Verlag GmbH & Co. KGaA, Weinheim-
dc.titleInking Elastomeric Stamps with Micro-Patterned, Single Layer Graphene to Create High-Performance OFETs-
dc.typeArticle-
dc.identifier.doi10.1002/adma.201101570-
dc.citation.journaltitleAdvanced Materials-
dc.identifier.wosid000294745300008-
dc.identifier.scopusid2-s2.0-80051686207-
dc.citation.endpage3535-
dc.citation.number31-
dc.citation.startpage3531-
dc.citation.volume23-
dc.description.isOpenAccessY-
dc.contributor.affiliatedAuthorLee, Gwan Hyoung-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.subject.keywordPlusFIELD-EFFECT TRANSISTORS-
dc.subject.keywordPlusLARGE-AREA-
dc.subject.keywordPlusFILMS-
dc.subject.keywordPlusRUBRENE-
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  • College of Engineering
  • Department of Materials Science & Engineering
Research Area 2D materials, 2차원 물질, Smiconductor process, semiconductor devices, 반도체 공정, 반도체 소자

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