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Cu(hfac)DMB를 이용한 Cu MOCVD에서 water vapor의 영향

DC Field Value Language
dc.contributor.advisor김기범-
dc.contributor.author김훈-
dc.date.accessioned2010-01-15T02:35:37Z-
dc.date.available2010-01-15T02:35:37Z-
dc.date.copyright2001.-
dc.date.issued2001-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000065050kor
dc.identifier.urihttps://hdl.handle.net/10371/30412-
dc.description학위논문(석사)--서울대학교 대학원 :재료공학부,2001.ko
dc.format.extentviii, 60 장ko
dc.language.isokoko
dc.publisher서울대학교 대학원ko
dc.titleCu(hfac)DMB를 이용한 Cu MOCVD에서 water vapor의 영향ko
dc.typeThesis-
dc.contributor.department재료공학부-
dc.description.degreeMasterko
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