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화학증폭형 감광막의 거칠기 예측을 위한 분자단위 시뮬레이션

DC Field Value Language
dc.contributor.advisor전국진-
dc.contributor.author이우진-
dc.date.accessioned2010-01-15T04:36:16Z-
dc.date.available2010-01-15T04:36:16Z-
dc.date.copyright2001.-
dc.date.issued2001-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000065179kor
dc.identifier.urihttps://hdl.handle.net/10371/31122-
dc.description학위논문(석사)--서울대학교 대학원 :전기.컴퓨터공학부,2001.ko
dc.format.extent32 장ko
dc.language.isokoko
dc.publisher서울대학교 대학원ko
dc.subjectChemically amplified resistsko
dc.subject화학증폭형 감광막ko
dc.subjectResist roughnessko
dc.subject감광막 거칠기ko
dc.subjectMolecular-scale lithographyko
dc.subject분자단위 시뮬레이션ko
dc.title화학증폭형 감광막의 거칠기 예측을 위한 분자단위 시뮬레이션ko
dc.typeThesis-
dc.contributor.department전기.컴퓨터공학부-
dc.description.degreeMasterko
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