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Ru과 RuO₂의 화학기상증착기구와 물성개선에 대한 연구 : A Study on the chemical vapor deposition of Ru and RuO₂thin film with ruthenocene precursor

DC Field Value Language
dc.contributor.advisor김기범-
dc.contributor.author박성언-
dc.date.accessioned2010-01-16T13:54:52Z-
dc.date.available2010-01-16T13:54:52Z-
dc.date.copyright1999.-
dc.date.issued1999-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000071444kor
dc.identifier.urihttps://hdl.handle.net/10371/34594-
dc.description학위논문(박사)--서울대학교 대학원 :금속공학과,1999.ko
dc.format.extentxiv, 188 p.ko
dc.language.isokoko
dc.publisher서울대학교 대학원ko
dc.subjectRuO₂ko
dc.subjectchemical vapor depositionko
dc.subjectRuko
dc.subjectRu incorporation rateko
dc.subjectruthenocene precursorko
dc.subject화학기상증착ko
dc.subjectRu 혼입속도ko
dc.titleRu과 RuO₂의 화학기상증착기구와 물성개선에 대한 연구ko
dc.title.alternativeA Study on the chemical vapor deposition of Ru and RuO₂thin film with ruthenocene precursorko
dc.typeThesis-
dc.contributor.department금속공학과-
dc.description.degreeDoctorko
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