Residual stress gradient relaxation and property modification of sputtered gold films by ion implantation

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Residual stress gradient relaxation and property modification of sputtered gold films by ion implantation

DC Field	Value	Language
dc.contributor.advisor	김용협	-
dc.contributor.author	강태준	-
dc.date.accessioned	2010-01-26T03:54:04Z	-
dc.date.available	2010-01-26T03:54:04Z	-
dc.date.copyright	2005.	-
dc.date.issued	2005	-
dc.identifier.uri	http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000052806	eng
dc.identifier.uri	https://hdl.handle.net/10371/44512	-
dc.description	Thesis(master`s)--서울대학교 대학원 :기계항공공학부,2005.	en
dc.format.extent	vii, 39 leaves	en
dc.language.iso	en	en
dc.publisher	서울대학교 대학원	en
dc.subject	미세전자기기시스템	en
dc.subject	MEMS	en
dc.subject	응력 구배	en
dc.subject	stress gradient	en
dc.subject	스퍼터링 금 박막	en
dc.subject	sputtered gold films	en
dc.subject	이온주입	en
dc.subject	ion implantation	en
dc.subject	표면미세가공	en
dc.subject	surface micromachining	en
dc.subject	계단형 지지대	en
dc.subject	step-ip anchor	en
dc.subject	플라즈마 애싱	en
dc.subject	plasma ashing	en
dc.subject	극미세압입기	en
dc.subject	nano-indentation	en
dc.title	Residual stress gradient relaxation and property modification of sputtered gold films by ion implantation	en
dc.type	Thesis	-
dc.contributor.department	기계항공공학부	-
dc.description.degree	Master	en

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