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超高眞空 電子回轉共鳴 플라즈마 化學氣狀蒸着 裝置 製作 및 실리콘 기판 洗淨과 炭化에의 응용 : Fabrication of ultra high vacuum electron cycloton resonance plasma chemical vapor deposition system and its application to the cleaning and carbonization of Si wafer

DC Field Value Language
dc.contributor.advisor황기웅-
dc.contributor.author표재확-
dc.date.accessioned2010-01-27T23:14:41Z-
dc.date.available2010-01-27T23:14:41Z-
dc.date.copyright2003.-
dc.date.issued2003-
dc.identifier.urihttp://library.snu.ac.kr/search/DetailView.ax?sid=1&cid=0001113355kog
dc.identifier.urihttps://hdl.handle.net/10371/45856-
dc.description학위논문(박사)--서울대학교 대학원 :전기·컴퓨터공학부,2003.ko
dc.format.extentxii, 136 장ko
dc.language.isokoko
dc.publisher서울대학교 대학원ko
dc.title超高眞空 電子回轉共鳴 플라즈마 化學氣狀蒸着 裝置 製作 및 실리콘 기판 洗淨과 炭化에의 응용ko
dc.title.alternativeFabrication of ultra high vacuum electron cycloton resonance plasma chemical vapor deposition system and its application to the cleaning and carbonization of Si waferko
dc.typeThesis-
dc.contributor.department전기·컴퓨터공학부-
dc.description.degreeDoctorko
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