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College of Dentistry/School of Dentistry (치과대학/치의학대학원)
Dept. of Dentistry (치의학과)
Journal Papers (저널논문_치의학과)
리스페리돈이 타액선 세포에 미치는 영향
- Issue Date
- 2008
- Publisher
- 대한소아치과학회
- Citation
- 대한소아치과학회지, 35:47-56, 2008.
- Keywords
- Risperidone ; Human salivary gland cells ; Intracellular calcium concentration ; Histamine ; Carbachol ; ATP
- Abstract
- Risperidone is a widely prescribed atypical antipsychotic agent. Approved by the FDA as the first drug to treat irritability associated with autism in children, it is also used to treat tic disorder and Tourette's syndrome. Its adverse reactions related to dentistry include dry mouth, the mechanism of which is yet to be identified. The aim of this study is to identify, at the cellular level, how and to what extent risperidone affects intracellular free calcium concentration (), an primary intracellular factor in the regulation of fluid secretion in salivary gland cells. The human salivary gland cell line (HSG) was grown in MEM supplemented with 10% BCS. In order to measure , Fura-2/AM was loaded in the HSG, and fluorescence at 340 nm/380 nm excitation was measured in the 500 nm emission ratio. After every experiment, a calibration experiment was conducted in order to readjust the ratio to the actual . Changes in were measured in the presence of carbachol, ATP and histamine. The researcher then explored how the pretreatment of risperidone affected such changes. Findings of this study include: 1. In HSG, increased due to the addition of carbachol, ATP and histamine. The presence of risperidone inhibited the action of histamine on this process, while making little effect on that of carbachol and ATP. 2. A quantification of in relation to histamine of different concentrations indicates that the effect of histamine was concentration dependent with an of . 3. The inhibitory effect of risperidone on histamine-induced was concentration-dependent with an of . 4. Risperidone inhibits histamine-induced Ca2+ release from endoplasmic reticulum and influx of extracellular in HSG cells(p<0.05).
- ISSN
- 1226-8496
- Language
- Korean
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