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저압 화학 증착법에 의한 텅스텐 박막의 특성 및 응용에 관한 연구 : The Formation of LPCVD-W thin films on SiO₂ for gate electrode application
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- Authors
- Advisor
- 김형준
- Issue Date
- 1995
- Publisher
- 서울대학교 대학원
- Keywords
- 저압화학증착법 ; LPCVD ; 텅스텐 박막 ; Tungsten Thin Film ; 실리콘산화막 ; Silicon Dioxide ; 실리콘질화막 ; Silicon Nitride ; 게이트 전극재료 ; MOS Capacitor
- Description
- 학위논문(박사)--서울대학교 대학원 :무기재료공학과,1995.
- Language
- Korean
- URI
- http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000084615
https://hdl.handle.net/10371/50818
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