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플라즈마 화학 증착법에 의해 제조된 (Ti₁-xA1x)N 박막의 특성에 관한 연구 : Properties of the (Ti₁-xA1x)N coatings deposited by plasma enhanced chemical vapor deposition

DC Field Value Language
dc.contributor.advisor이정중-
dc.contributor.author김병준-
dc.date.accessioned2010-02-05T06:43:01Z-
dc.date.available2010-02-05T06:43:01Z-
dc.date.copyright1998.-
dc.date.issued1998-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000074773kog
dc.identifier.urihttps://hdl.handle.net/10371/50846-
dc.description학위논문(박사)--서울대학교 대학원 :금속공학과,1998.ko
dc.format.extentx, 123 장ko
dc.language.isokoko
dc.publisher서울대학교 대학원ko
dc.subject플라즈마 화학기상증착ko
dc.subjecta(Ti,Al)Nko
dc.subject플라즈마 전처리ko
dc.subjectplasma enhanced chemical vapor deposition(PECVD)ko
dc.subject농도경사피막ko
dc.subjectplasma pre-treatmentko
dc.subject접착력ko
dc.subjectcompositionally gradient coatingko
dc.subject피막산화특성ko
dc.subjectadhesion strengthko
dc.title플라즈마 화학 증착법에 의해 제조된 (Ti₁-xA1x)N 박막의 특성에 관한 연구ko
dc.title.alternativeProperties of the (Ti₁-xA1x)N coatings deposited by plasma enhanced chemical vapor depositionko
dc.typeThesis-
dc.contributor.department금속공학과-
dc.description.degreeDoctorko
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