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PECVD법에 의해 제조된 TiN 박막의 증착 특성 및 내부 응력 : Deposition characteristics and internal stresses of PECVD-TiN thin films
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 이후철 | - |
| dc.contributor.author | 송병창 | - |
| dc.date.accessioned | 2010-02-05T06:43:20Z | - |
| dc.date.available | 2010-02-05T06:43:20Z | - |
| dc.date.copyright | 1997. | - |
| dc.date.issued | 1997 | - |
| dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000079630 | kog |
| dc.identifier.uri | https://hdl.handle.net/10371/50852 | - |
| dc.description | 학위논문(박사)--서울대학교 대학원 :금속공학과,1997. | ko |
| dc.format.extent | x, 123 장 | ko |
| dc.language.iso | ko | ko |
| dc.publisher | 서울대학교 대학원 | ko |
| dc.subject | 잔류 염소량 | ko |
| dc.subject | PECVD | ko |
| dc.subject | 음극 암부 포텐셜 | ko |
| dc.subject | TiN | ko |
| dc.subject | 우선 방위 천이 현상 | ko |
| dc.subject | hot electrode | ko |
| dc.subject | 임계 두께 | ko |
| dc.subject | cold electrode | ko |
| dc.subject | 표면 에너지 | ko |
| dc.subject | residual chlorine content | ko |
| dc.title | PECVD법에 의해 제조된 TiN 박막의 증착 특성 및 내부 응력 | ko |
| dc.title.alternative | Deposition characteristics and internal stresses of PECVD-TiN thin films | ko |
| dc.type | Thesis | - |
| dc.contributor.department | 금속공학과 | - |
| dc.description.degree | Doctor | ko |
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