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저온 화학증착에 의해 제조된 TiN의 우선방위와 접착력 : Preferred orientation and adhesion of titanium nitride films produced by low temperature chemical vapor deposition
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 김상주 | - |
| dc.contributor.author | 민우식 | - |
| dc.date.accessioned | 2010-02-05T06:44:43Z | - |
| dc.date.available | 2010-02-05T06:44:43Z | - |
| dc.date.copyright | 1995. | - |
| dc.date.issued | 1995 | - |
| dc.identifier.uri | http://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000085076 | kog |
| dc.identifier.uri | https://hdl.handle.net/10371/50879 | - |
| dc.description | 학위논문(박사)--서울대학교 대학원 :금속공학과,1995. | ko |
| dc.format.extent | x, 109 장 | ko |
| dc.language.iso | ko | ko |
| dc.publisher | 서울대학교 대학원 | ko |
| dc.subject | low temperature chemical vapor deposition | ko |
| dc.subject | 저온화학증착 | ko |
| dc.subject | titanium nitride | ko |
| dc.subject | 티타늄 나이트라이드 | ko |
| dc.subject | preferred orientation | ko |
| dc.subject | 우선방위 | ko |
| dc.subject | the lowest energy plane | ko |
| dc.subject | 최소에너지면 | ko |
| dc.subject | cleavage plane | ko |
| dc.subject | 벽개면 | ko |
| dc.title | 저온 화학증착에 의해 제조된 TiN의 우선방위와 접착력 | ko |
| dc.title.alternative | Preferred orientation and adhesion of titanium nitride films produced by low temperature chemical vapor deposition | ko |
| dc.type | Thesis | - |
| dc.contributor.department | 금속공학과 | - |
| dc.description.degree | Doctor | ko |
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