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The deposition characteristics of TaCN films deposited by MOCVD (metallorganic chemical vapor deposition) : 유기금속화학증착 법으로 증착한 TaCN 박막의 증착특성

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dc.contributor.advisor김기범-
dc.contributor.author전규창-
dc.date.accessioned2010-02-08T07:52:27Z-
dc.date.available2010-02-08T07:52:27Z-
dc.date.copyright1996.-
dc.date.issued1996-
dc.identifier.urihttp://dcollection.snu.ac.kr:80/jsp/common/DcLoOrgPer.jsp?sItemId=000000082012eng
dc.identifier.urihttps://hdl.handle.net/10371/52244-
dc.descriptionThesis (master`s)--서울대학교 대학원 :금속공학과 재료공학전공,1996.en
dc.format.extentv, 37 p.en
dc.language.isoenen
dc.publisher서울대학교 대학원en
dc.titleThe deposition characteristics of TaCN films deposited by MOCVD (metallorganic chemical vapor deposition)en
dc.title.alternative유기금속화학증착 법으로 증착한 TaCN 박막의 증착특성-
dc.typeThesis-
dc.contributor.department금속공학과 재료공학전공-
dc.description.degreeMasteren
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